China’s EUV Gap: 10–15 Years Behind ASML in the Global AI Chip Race

‼️ 🧠 China remains roughly 10–15 years behind the frontier in advanced chipmaking equipment, according to Zeiss and UBS. Zeiss—exclusive supplier of the optics inside ASML’s EUV lithography systems—said China may need about 15 years to develop comparable EUV capability, while UBS estimates a viable domestic alternative remains at least a decade away; the analysts liken China’s current progress to ASML’s position in 2004. The gap matters because EUV is essential to manufacturing leading-edge AI chips, while Zeiss components underpin production of about 80% of global semiconductors. China could nevertheless reach high-volume production of less-advanced immersion DUV tools within two to five years

Leave a comment